Julian
Schulze obtained his PhD in plasma physics from Bochum University, Germany, in 2009. After a postdoctoral stay at the Wigner Research Center for Physics, Hungary, in 2010/11 he became an Assistant Professor for Plasma Physics at West Virginia University, USA, in 2013. In 2016 he returned to the Ruhr-University Bochum, Germany, where he is now a professor for plasma technology in the Department of Electrical Engineering. He is also a Visiting Professor in the Physics Department of Dalian University of Technology, China, a member of the editorial board of Plasma Sources Science and Technology, and the previous Executive Committee Chair of the Gaseous Electronics Conference (GEC). His research interests are focused on high frequency non-equilibrium technological plasmas, charged particle power absorption dynamics, Voltage Waveform Tailoring, plasma-surface interactions, and knowledge based plasma process development based on experiments, simulations, and modeling. Prof. Schulze has published more than 200 papers in international peer-reviewed journals and has co-authored more than 300 presentations at conferences in plasma science.
Julian
Schulze (Ruhr University Bochum Germany)
Title: Control of charged particle power absorption and transport in non-equilibrium technological discharges for plasma process development
Abstract: Technological low temperature plasmas are complex non-linear many particle systems characterized by a strong thermal non-equilibrium between hot electrons and cold heavy particle species (ions, neutral). Strongly space and time dependent electromagnetic field distributions determine the transport of charged particles and their energy as well as angular distribution functions at boundary surfaces, which are essential for materials processing in such discharges used for semiconductor manufacturing, but also for environmental applications such as gas conversion. This talk will present the current understanding of charged particle power absorption dynamics and transport in capacitively as well as inductively coupled high frequency technological plasmas and introduce novel methods to control such dynamics for enhanced knowledge based process control. This includes insights into the fundamentals of different modes of plasma operation, the effects of Voltage Waveform Tailoring and customized boundary surfaces to control energy distribution functions of electrons and ions, the generation of process relevant neutral radicals, and plasma uniformity. Selected applications of such knowledge based plasma control concepts will be discussed.
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